Ultrahigh-resolution nanoimprint patterning of quantum-dot light-emitting diodes via capillary self-assembly

17 min read Original article ↗

Data availability

Source data are provided with this paper. All other data that support the plots within this paper and other findings of this study are available from the corresponding authors on request.

References

  1. Deng, Y. et al. Solution-processed green and blue quantum-dot light-emitting diodes with eliminated charge leakage. Nat. Photon. 16, 505–511 (2022).

    Article  ADS  Google Scholar 

  2. Wu, Q. et al. Homogeneous ZnSeTeS quantum dots for efficient and stable pure-blue LEDs. Nature 639, 633–638 (2025).

    Article  ADS  Google Scholar 

  3. Jiang, Y. et al. Synthesis-on-substrate of quantum dot solids. Nature 612, 679–684 (2022).

    Article  ADS  Google Scholar 

  4. Yang, D. et al. Toward stable and efficient perovskite light-emitting diodes. Adv. Funct. Mater. 32, 2109495 (2022).

    Article  Google Scholar 

  5. Dai, X. et al. Solution-processed, high-performance light-emitting diodes based on quantum dots. Nature 515, 96–99 (2014).

    Article  ADS  Google Scholar 

  6. Kagan, C. R., Lifshitz, E., Sargent, E. H. & Talapin, D. V. Building devices from colloidal quantum dots. Science 353, aac5523 (2016).

    Article  Google Scholar 

  7. Shen, H. et al. Visible quantum dot light-emitting diodes with simultaneous high brightness and efficiency. Nat. Photon. 13, 192–197 (2019).

    Article  ADS  Google Scholar 

  8. Lee, T.-W. Over a decade of progress in metal-halide perovskite light-emitting diodes. Adv. Mater. 37, 2508542 (2025).

    Article  Google Scholar 

  9. Kim, D. C. et al. Intrinsically stretchable quantum dot light-emitting diodes. Nat. Electron. 7, 365–374 (2024).

    Article  Google Scholar 

  10. Triana, M. A., Hsiang, E.-L., Zhang, C., Dong, Y. & Wu, S.-T. Luminescent nanomaterials for energy-efficient display and healthcare. ACS Energy Lett. 7, 1001–1020 (2022).

    Article  Google Scholar 

  11. Miao, W.-C. et al. Microdisplays: mini-LED, micro-OLED, and micro-LED. Adv. Opt. Mater. 12, 2300112 (2024).

    Article  Google Scholar 

  12. Wei, K. et al. Perovskite heteroepitaxy for high-efficiency and stable pure-red LEDs. Nature 638, 949–956 (2025).

    Article  ADS  Google Scholar 

  13. Dai, X., Deng, Y., Peng, X. & Jin, Y. Quantum-dot light-emitting diodes for large-area displays: towards the dawn of commercialization. Adv. Mater. 29, 1607022 (2017).

    Article  Google Scholar 

  14. Liu, Z. et al. Micro-light-emitting diodes with quantum dots in display technology. Light Sci. Appl. 9, 83 (2020).

    Article  ADS  Google Scholar 

  15. Chen, S. et al. On the degradation mechanisms of quantum-dot light-emitting diodes. Nat. Commun. 10, 765 (2019).

    Article  ADS  Google Scholar 

  16. Jang, K. Y., Chang, S. E., Kim, D.-H., Yoon, E. & Lee, T.-W. Nanocrystalline perovskites for bright and efficient light-emitting diodes. Adv. Mater. 37, 2415648 (2025).

    Article  Google Scholar 

  17. Fan, J. et al. Recent progress of quantum dots light-emitting diodes: materials, device structures, and display applications. Adv. Mater. 36, 2312948 (2024).

    Article  Google Scholar 

  18. Lu, X. et al. Accelerated response speed of quantum-dot light-emitting diodes by hole-trap-induced excitation memory. Nat. Electron. 8, 331–342 (2025).

    Article  Google Scholar 

  19. Qian, L., Zheng, Y., Xue, J. & Holloway, P. H. Stable and efficient quantum-dot light-emitting diodes based on solution-processed multilayer structures. Nat. Photon. 5, 543–548 (2011).

    Article  ADS  Google Scholar 

  20. Lin, Q. et al. Flexible quantum dot light-emitting device for emerging multifunctional and smart applications. Adv. Mater. 35, 2210385 (2023).

    Article  Google Scholar 

  21. Zhang, Z. et al. High-performance, solution-processed, and insulating-layer-free light-emitting diodes based on colloidal quantum dots. Adv. Mater. 30, 1801387 (2018).

    Article  Google Scholar 

  22. Lee, T. et al. Bright and stable quantum dot light-emitting diodes. Adv. Mater. 34, 2106276 (2022).

    Article  Google Scholar 

  23. Zhong, C. et al. High-performance, high-resolution quantum dot light-emitting diodes with self-assembly single-molecular interface modification. Nano Lett. 24, 14125–14132 (2024).

    Article  ADS  Google Scholar 

  24. Kwon, J. I. et al. Ultrahigh-resolution full-color perovskite nanocrystal patterning for ultrathin skin-attachable displays. Sci. Adv. 8, eadd0697 (2022).

    Article  Google Scholar 

  25. Kim, T.-H. et al. Full-colour quantum dot displays fabricated by transfer printing. Nat. Photon. 5, 176–182 (2011).

    Article  ADS  Google Scholar 

  26. Mei, W. et al. High-resolution, full-color quantum dot light-emitting diode display fabricated via photolithography approach. Nano Res. 13, 2485–2491 (2020).

    Article  Google Scholar 

  27. Meng, T. et al. Ultrahigh-resolution quantum-dot light-emitting diodes. Nat. Photon. 16, 297–303 (2022).

    Article  ADS  Google Scholar 

  28. Lin, L. et al. Flexible ultrahigh-resolution quantum-dot light-emitting diodes. Adv. Funct. Mater. 34, 2408604 (2024).

    Article  Google Scholar 

  29. Feng, F. et al. High-power AlGaN deep-ultraviolet micro-light-emitting diode displays for maskless photolithography. Nat. Photon. 19, 101–108 (2025).

    Article  ADS  Google Scholar 

  30. Liu, Y. et al. Inkjet-printed unclonable quantum dot fluorescent anti-counterfeiting labels with artificial intelligence authentication. Nat. Commun. 10, 2409 (2019).

    Article  ADS  Google Scholar 

  31. Chen, M. et al. High performance inkjet-printed QLEDs with 18.3% EQE: improving interfacial contact by novel halogen-free binary solvent system. Nano Res. 14, 4125–4131 (2021).

    Article  ADS  Google Scholar 

  32. Hahm, D. et al. Direct patterning of colloidal quantum dots with adaptable dual-ligand surface. Nat. Nanotechnol. 17, 952–958 (2022).

    Article  ADS  Google Scholar 

  33. Qie, Y. et al. Ligand-nondestructive direct photolithography assisted by semiconductor polymer cross-linking for high-resolution quantum dot light-emitting diodes. Nano Lett. 24, 1254–1260 (2024).

    Article  ADS  Google Scholar 

  34. Gao, H. et al. High-performance, high-resolution quantum dot light-emitting devices through photolithographic patterning. Org. Electron. 108, 106609 (2022).

    Article  Google Scholar 

  35. Luo, C. et al. High-resolution, highly transparent, and efficient quantum dot light-emitting diodes. Adv. Mater. 35, 2303329 (2023).

    Article  Google Scholar 

  36. Zhao, J. et al. Large-area patterning of full-color quantum dot arrays beyond 1000 pixels per inch by selective electrophoretic deposition. Nat. Commun. 12, 4603 (2021).

    Article  ADS  Google Scholar 

  37. Luo, C. et al. Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition. Light Sci. Appl. 13, 273 (2024).

    Article  ADS  Google Scholar 

  38. Bai, W. et al. Microscale perovskite quantum dot light-emitting diodes (micro-PeLEDs) for full-color displays. Adv. Opt. Mater. 10, 2200087 (2022).

    Article  Google Scholar 

  39. Cho, H. et al. Direct optical patterning of quantum dot light-emitting diodes via in situ ligand exchange. Adv. Mater. 32, 2003805 (2020).

    Article  Google Scholar 

  40. Wang, Y., Fedin, I., Zhang, H. & Talapin, D. V. Direct optical lithography of functional inorganic nanomaterials. Science 357, 385–388 (2017).

    Article  ADS  Google Scholar 

  41. Kim, T.-H. et al. Heterogeneous stacking of nanodot monolayers by dry pick-and-place transfer and its applications in quantum dot light-emitting diodes. Nat. Commun. 4, 2637 (2013).

    Article  ADS  Google Scholar 

  42. Choi, M. K. et al. Wearable red–green–blue quantum dot light-emitting diode array using high-resolution intaglio transfer printing. Nat. Commun. 6, 7149 (2015).

    Article  ADS  Google Scholar 

  43. Kim, B. H. et al. Multilayer transfer printing for pixelated, multicolor quantum dot light-emitting diodes. ACS Nano 10, 4920–4925 (2016).

    Article  Google Scholar 

  44. Nam, T. W. et al. Thermodynamic-driven polychromatic quantum dot patterning for light-emitting diodes beyond eye-limiting resolution. Nat. Commun. 11, 3040 (2020).

    Article  ADS  Google Scholar 

  45. Meitl, M. A. et al. Transfer printing by kinetic control of adhesion to an elastomeric stamp. Nat. Mater. 5, 33–38 (2006).

    Article  ADS  Google Scholar 

  46. Yoo, J. et al. Highly efficient printed quantum dot light-emitting diodes through ultrahigh-definition double-layer transfer printing. Nat. Photon. 18, 1105–1112 (2024).

    Article  ADS  Google Scholar 

  47. Lian, Y. et al. Downscaling micro- and nano-perovskite LEDs. Nature 640, 62–68 (2025).

    Article  ADS  Google Scholar 

  48. Cao, W. et al. Spray-deposited anisotropic ferromagnetic hybrid polymer films of ps-b-pmma and strontium hexaferrite magnetic nanoplatelets. ACS Appl. Mater. Interfaces 13, 1592–1602 (2021).

    Article  Google Scholar 

  49. Cao, W. et al. In situ study of FePt nanoparticles-induced morphology development during printing of magnetic hybrid diblock copolymer films. Adv. Funct. Mater. 32, 2107667 (2022).

    Article  Google Scholar 

  50. Jacobs M. H. Diffusion Processes (Springer, 1935).

  51. Batchelor G. K. An Introduction to Fluid Dynamics (Cambridge Univ. Press, 2000).

Download references

Acknowledgements

We acknowledge the financial support from the National Natural Science Foundation of China (grants 92263209 to Y.L., 52403358 to W.C. and 52103077 to F.Y.) and from the Foundation of Cangzhou Research Institute (grant TGCYY-F-0310 to F.Y.). We thank X. C. Zhang and H. Y. Li from the Department of Macromolecular Science and the Nanofabrication Lab at Fudan University for assistance with template fabrication. We also acknowledge S. Hu and Z. Y. Jia from the School of Electronics and Information Engineering at Tiangong University for help with experimental data analysis. We are grateful to J. Guo and Y. Zhang from the School of Chemistry at Tiangong University for support in device testing and characterization, and to J. X. Low, W. B. Zhang and J. H. Li from the School of Physical Science and Technology at Tiangong University for assistance in sample preparation.

Author information

Authors and Affiliations

  1. School of Physical Science and Technology, Tiangong University, Tianjin, China

    Wei Cao, Pan Zeng, Zhiming Chen, Haitao Liu, Jian Li, Tao Sun, Fan Yang & Yue Li

  2. School of Material Science and Engineering, Tiangong University, Tianjin, China

    Sen Tian & Kaitao Liu

  3. Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, China

    Chao Zhong & Fushan Li

  4. State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, Fudan University, Shanghai, China

    Li Qiu, Xiancheng Zhang & Zhihong Nie

  5. School of Electronics and Information Engineering, Tiangong University, Tianjin, China

    Pingfan Ning, Delin Zhang, Wenhong Wang & Yong Jiang

  6. Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei, China

    An Cao, Liang Li, Dilong Liu & Yue Li

Authors

  1. Wei Cao
  2. Sen Tian
  3. Chao Zhong
  4. Li Qiu
  5. Pan Zeng
  6. Zhiming Chen
  7. Xiancheng Zhang
  8. Haitao Liu
  9. Kaitao Liu
  10. Jian Li
  11. Tao Sun
  12. Pingfan Ning
  13. Delin Zhang
  14. Wenhong Wang
  15. Yong Jiang
  16. An Cao
  17. Liang Li
  18. Dilong Liu
  19. Zhihong Nie
  20. Fan Yang
  21. Fushan Li
  22. Yue Li

Contributions

Y.L., F.Y., F.L., L.Q. and W.C. conceived of the strategy of the nanoimprinting method and designed the experiment. W.C., S.T., C.Z., H.L., K.L. and T.S. carried out experiments and characterizations. F.Y. and X.Z. performed the fabrication of silicon nanopillar masters and numerical simulation. W.C., S.T., F.Y. and L.Q. carried out the preparation of QD arrays and performed the SEM measurements. H.L., W.C., F.Y. and S.T. performed the fabrication of RGB QD arrays. K.L. and J.L. performed quantum yield measurements. W.C., S.T., C.Z. and F.Y. fabricated and characterized the nano-QLEDs. S.T., C.Z. and J.L. carried out the fabrication of flexible red nano-QLEDs and spin-coated QLEDs. Y.L., F.Y., F.L. and W.C. analysed the device performance. S.T. and L.Q. performed the AFM, transmission electron microscopy and photoluminescence characterizations. W.C., S.T., C.Z., L.Q., Z.C., P.Z., P.N., D.Z., W.W., Y.J., A.C., L.L., D.L., Z.N., F.L., F.Y. and Y.L. discussed the experimental results. F.Y., W.C. and S.T. prepared the paper. Y.L., F.Y., F.L. and W.C. revised the paper. W.C., S.T., C.Z. and L.Q. contributed equally to this work.

Corresponding authors

Correspondence to Fan Yang, Fushan Li or Yue Li.

Ethics declarations

Competing interests

The authors declare no competing interests.

Peer review

Peer review information

Nature Photonics thanks the anonymous reviewers for their contribution to the peer review of this work.

Additional information

Publisher’s note Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.

Extended data

Extended Data Fig. 1 Fabrication and characterization of nanohole-patterned PDMS molds using electron beam lithography (EBL)-defined Si nanopillar templates with varying periods.

a, Fabrication processes of nanohole-patterned PDMS mold. The following nine steps are involved in this method: (1) Spin-coating of positive electron-beam resist PMMA onto a Si substrate. (2) Fabrication of the designed PMMA nanohole array using high-resolution EBL. (3)–(6) Development of the exposed resist, deposition of a Cr film, and lift-off process to obtain the designed Cr nanopillar array. (7) Reactive ion etching (RIE) using Cr as a hard mask to etch into the underlying Si to a depth of approximately 350 nm. (8) Removal of the Cr mask using a Cr etchant, resulting in Si nanopillar arrays. (9) Surface fluorination and replica molding to fabricate a nanohole-patterned PDMS mold. b-e, SEM and optical images of the Si nanopillar templates with periods of 600 nm (b), 300 nm (c), 200 nm (d), and 150 nm (e). The top-left inset shows an optical image of the entire patterned region, covering an area of 8 × 8 mm² (b), 3 × 3 mm² (c), 0.2 × 0.2 mm² (d), and 2.5 × 2.5 mm² (e).

Extended Data Fig. 2 Fabrication and characterization of full-color RGB QD array patterns via sequential nanoimprint alignment.

a, Schematic illustration of the fabrication process for red–green–blue (RGB) QD array patterns. Green QDs were first imprinted onto the TFB-coated substrate, which contains alignment markers. The PDMS mold used for imprinting also carries corresponding alignment marks, enabling precise registration under an optical microscope. After imprinting, the PDMS mold was peeled off, leaving behind a green QD array. Subsequently, blue QDs were aligned and imprinted using the same method with the aid of the alignment markers and optical microscope, resulting in a green–blue patterned QD array. Finally, red QDs were imprinted to complete the full-color RGB QD array pattern as designed. b, SEM image of the designed Si nanopillar template structure and its magnified view (scale bar = 20 μm). c, Optical image of the corresponding PDMS mold and its magnified view (scale bar = 20 μm). d, Fluorescence microscope images of the imprinted QD array patterns: green (i), green–blue (ii), and red–green–blue (iii).

Extended Data Fig. 3 Nanoimprint patterning of high-resolution QD arrays on rigid and flexible substrates.

a, Schematic diagram of large-area patterning of ultra-high resolution QD array by nanoimprint lithography assisted by capillary force. Schematic illustration of the fabrication steps: (i) A lithographic pattern was written by laser direct writing onto a positive photoresist-coated substrate, without development. (ii) A QD array was imprinted onto the surface of the patterned photoresist. (iii) After solvent evaporation, the PDMS mold was peeled off, leaving the QD array deposited onto the photoresist surface. (iv) Development was then carried out, resulting in photoresist structures overlaid with QD arrays on either rigid (for example, Si) or flexible (for example, PET) substrates. 5° (b), 10° (c), 15° (d), and 20° (e). The integrity of the pattern type and shape is well preserved, demonstrating excellent mechanical flexibility and structural robustness of the imprinted QD arrays.

Extended Data Fig. 4 Microscope images of electroluminescent (EL) micro/nano-QLEDs.

a–e, EL images of red QLEDs with QD array periods of 20 µm (1,270 PPI) (a), 3 µm (8,467 PPI) (b), 1.5 µm (16,933 PPI) (c), 1 µm (25,400 PPI) (d), and 150 nm (169,333 PPI) (e). f–j, EL images of green QLEDs with QD array periods of 20 µm (1,270 PPI) (f), 3 µm (8,467 PPI) (g), 1.5 µm (16,933 PPI) (h), 1 µm (25,400 PPI) (i), and 150 nm (169,333 PPI) (j). k–o, EL images of blue QLEDs with QD array periods of 20 µm (1,270 PPI) (k), 3 µm (8,467 PPI) (l), 1.5 µm (16,933 PPI) (m), 1 µm (25,400 PPI) (n), and 150 nm (169,333 PPI) (o).

Extended Data Fig. 5 Integrated nanoimprint active-matrix micro-QLEDs.

a, Schematic illustration of the fabrication process for the active-matrix micro-QLED display. The fabrication process includes four main steps: (i) Cleaning of the TFT array substrate; (ii) Deposition of functional layers, including PEDOT:PSS and TFB, followed by nanoimprinting of red QD stripe patterns with a period of approximately 780 nm; (iii) Red QD stripe nanopatterns remained after PDMS stamp removal; (iv) Deposition of the remaining functional layers by spin-coating PMMA and ZnMgO, followed by electrode deposition and device encapsulation. b, Optical image of the TFT array substrate. c, AFM characterization of the line-patterned template employed for PDMS mold fabrication. The inset shows the height profile extracted from the AFM image. d, Photograph of the integrated nanoimprint active-matrix micro-QLEDs. The nano-patterned QD nanostripes are uniformly and reproducibly nanoimprinted across the TFT array substrate over a large area. Each microscale pixel unit (300 μm × 150 µm) contains hundreds of these nanoscale QD line structures. e, Fluorescence microscopy image of the patterned red QD nanostripes. f, Displayed images generated by a micro-QLED active-matrix prototype based on a commercial TFT array (300 μm × 150 μm pixel dimensions).

Extended Data Fig. 6 Characterization of ultrahigh-resolution blue nano-QLEDs.

a, Schematic diagram of the fabricated ultrahigh-resolution blue nano-QLED device. ITO/PEDOT:PSS/PF8Cz/QD-PMMA/ZnMgO/Al, in which the QD-embedded PMMA layer serves as the EML. b, Energy band diagram of the ultrahigh-resolution blue nano-QLEDs. c-g, EL spectrum (c), J–V (d), EQE–L (e), L–V (f), and CE-L (g) characteristics of blue nano-QLEDs. The inset in (c) is a schematic illustration of high-resolution blue QD emission patterns. h, Comparison of EQE values for nano-QLEDs with different PPIs and reference spin-coated QLEDs. Error bars represent the standard deviation from 3 individually tested devices. Whiskers: maxima and minima; bounds of box: 25th and 75th percentile; empty squares: mean.

Extended Data Fig. 7 EL characteristics and efficiency statistics of spin-coated and nanoimprinted red nano-QLEDs with varying pixel sizes and PPIs.

a-c, EL spectrum (a), J-V-L (b), and EQE-L-CE (c) characteristics of red QLEDs fabricated by spin coating. Inset: Optical image of the electroluminescence emission. Three representative devices were tested, all exhibiting peak EQEs exceeding 22%, with values of 23.9%, 23.5%, and 22.2%, respectively, indicating excellent device stability and reproducibility. d-f, EL spectrum (d), J-V-L (e), and EQE-L-CE (f) characteristics of red nano-QLEDs (42,333 PPI). Inset: Optical image of the electroluminescence emission. Three representative devices were tested, all exhibiting peak EQEs exceeding 17%, with values of 20.2%, 19.2%, and 17.8%, respectively, indicating minimal efficiency reduction. g-i, EL spectrum (g), J-V-L (h), and EQE-L-CE (i) characteristics of red nano-QLEDs (84,667 PPI). Inset: Optical image of the electroluminescence emission. Three representative devices were tested, all exhibiting peak EQEs exceeding 18%, with values of 18.9%, 18.8%, and 18.2%, respectively, indicating minimal efficiency reduction. j-l, EL spectrum (j), J-V-L (k), and EQE-L-CE (l) characteristics of red nano-QLEDs (169,333 PPI). Inset: Optical image of the electroluminescence emission. Three representative devices were tested, all exhibiting peak EQEs exceeding 16%, with values of 17.5%, 17.3%, and 16.2%, respectively, indicating minimal efficiency reduction.

Extended Data Fig. 8 EL characteristics and efficiency statistics of spin-coated and nanoimprinted green nano-QLEDs with varying pixel sizes and PPIs.

a-c, EL spectrum (a), J-V-L (b), and EQE-L-CE (c) characteristics of green QLEDs fabricated by spin coating. Inset: Optical image of the electroluminescence emission. Three representative devices were tested, all exhibiting peak EQEs exceeding 15%, with values of 16.6%, 16.2%, and 15.7%, respectively, indicating excellent device stability and reproducibility. d-f, EL spectrum (d), J-V-L (e), and EQE-L-CE (f) characteristics of green nano-QLEDs (42,333 PPI). Inset: Optical image of the electroluminescence emission. Three representative devices were tested, all exhibiting peak EQEs exceeding 13%, with values of 13.9%, 13.8%, and 13.3%, respectively, indicating minimal efficiency reduction. g-i, EL spectrum (g), J-V-L (h), and EQE-L-CE (i) characteristics of green nano-QLEDs (84,667 PPI). Inset: Optical image of the electroluminescence emission. Three representative devices were tested, all exhibiting peak EQEs exceeding 12%, with values of 13.1%, 12.3%, and 12.1%, respectively, indicating minimal efficiency reduction. j-l, EL spectrum (j), J-V-L (k), and EQE-L-CE (l) characteristics of green nano-QLEDs (169,333 PPI). Inset: Optical image of the electroluminescence emission. Three representative devices were tested, all exhibiting peak EQEs exceeding 10%, with values of 11.0%, 10.4%, and 10.0%, respectively, indicating minimal efficiency reduction.

Extended Data Fig. 9 Functional layer structures for red nano-QLEDs.

a, b, Schematic illustration (a) and cross-sectional SEM image (b) showing functional layer structures, in which the emission layer consists of an array of monolayer QDs. For single-layer QD devices, the EML thickness is approximately 15.7 nm. c, d, Schematic illustration (c) and cross-sectional SEM image (d) showing functional layer structures, in which the emission layer consists of an array of multilayer QDs. In multilayer QD configurations, the EML thickness increases to approximately 37.3 nm.

Extended Data Fig. 10 Structural design, optical performance, and mechanical stability of the red flexible nano-QLED device.

a, Schematic diagram of the fabricated ultrahigh-resolution red flexible nano-QLED device: PET/ITO/PEDOT:PSS/TFB/QD-PMMA/ZnMgO/Ag. b, EL optical images of the red flexible nano-QLED device before and after bending. c Fluorescence image of the QD array on a flexible PET substrate. d, EL spectra of the device before and after bending. e, JV characteristics before and after bending. f, Relationships between EQE and luminance before and after bending. g, LV characteristics before and after bending. h, Current efficiency as a function of luminance before and after bending. The device was bent at a bending radius of 3.27 mm for 10 and 50 cycles, and its performance was evaluated before and after the bending cycles to assess mechanical stability.

Supplementary information

Supplementary Information

Supplementary Texts 1–4, Figs. 1–24, Tables 1 and 2, and refs. 1–33.

Supplementary Video 1

The active-matrix micro-QLED display demonstrating the video clip ‘Dynamic Footage of Traditional Chinese Buildings’.

Supplementary Video 2

The active-matrix micro-QLED display demonstrating the video clip ‘Phoenix Rebirth’.

Source data

Source Data Fig. 1

GISAXS and pixel size statistical data.

Source Data Fig. 2

Capillary action and morphology data.

Source Data Fig. 3

QD number statistical distributions.

Source Data Fig. 4

Statistics of EL performance for nano-QLEDs.

Source Data Fig. 5

Average EQE and EL area versus pixel density for LEDs.

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Cao, W., Tian, S., Zhong, C. et al. Ultrahigh-resolution nanoimprint patterning of quantum-dot light-emitting diodes via capillary self-assembly. Nat. Photon. (2026). https://doi.org/10.1038/s41566-025-01836-5

Download citation

  • Received:

  • Accepted:

  • Published:

  • Version of record:

  • DOI: https://doi.org/10.1038/s41566-025-01836-5